Denbeaux, G: search on Z-Library

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1

The Biblical Hope

Denbeaux, F. J.

Journal:

Interpretation A Journal of Bible and Theology

Year:

1951

Language:

english

File:

PDF, 1.52 MB

english, 1951

2

Out-of-band radiation mitigation at 10.6 μ m by molecular absorbers in laser-produced plasma extreme ultraviolet sources

Mbanaso, Chimaobi, Antohe, Alin, Bull, Horace, Goodwin, Frank, Hershcovitch, Ady, Denbeaux, Gregory

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2012

Language:

english

File:

PDF, 891 KB

english, 2012

3

Studying thickness loss in extreme ultraviolet resists due to electron beam exposure using experiment and modeling

Narasimhan, Amrit, Grzeskowiak, Steven, Srivats, Bharath, Herbol, Henry, Wisehart, Liam, Schad, Jonathon, Kelly, Chris, Earley, William, Ocola, Leonidas E., Neisser, Mark, Denbeaux, Greg, Brainard, Ro

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2015

Language:

english

File:

PDF, 1.06 MB

english, 2015

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Energy deposition and charging in EUV lithography: Monte Carlo studies

Panning, Eric M., Goldberg, Kenneth A., Wiseheart, Liam, Narasimhan, Amrit, Grzeskowiak, Steven, Neisser, Mark, Ocola, Leonidas E., Denbeaux, Greg, Brainard, Robert L.

Year:

2016

Language:

english

File:

PDF, 806 KB

english, 2016

5

The Presence of the Kingdom, by Jacques Ellul, Translated by Olive Wyon. 153 pp. Philadelphia, Westminster Press, 1952. $2.50

Journal:

Year:

1954

Language:

english

File:

PDF, 132 KB

english, 1954

6

Resolution, Line-Edge Roughness, Sensitivity Tradeoff, and Quantum Yield of High Photo Acid Generator Resists for Extreme Ultraviolet Lithography

Higgins, Craig D., Szmanda, Charles R., Antohe, Alin, Denbeaux, Greg, Georger, Jacque, Brainard, Robert L.

Journal:

Japanese Journal of Applied Physics

Year:

2011

Language:

english

File:

PDF, 1.24 MB

english, 2011

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Resist outgassing contamination on EUV multilayer mirror analogues

Wood, Obert R., Panning, Eric M., Alvarado, Diego, Kandel, Yudhishthir, Sohn, Jaewoong, Chakraborty, Tonmoy, Ashworth, Dominic, Denbeaux, Gregory

Year:

2014

Language:

english

File:

PDF, 413 KB

english, 2014

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Developing particle detection test bench for vacuum components

Khopkar, Yashdeep, Herbol, Henry, Upadhyaya, Mihir, Denbeaux, Gregory, Jindal, Vibhu, Kearney, Patrick, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 630 KB

english, 2012

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Direct measurement of carbon contamination topography on patterned EUV masks

Wood, Obert R., Panning, Eric M., Fan, Yu-Jen, Murray, Thomas, Goodwin, Frank, Ashworth, Dominic, Denbeaux, Gregory

Year:

2014

Language:

english

File:

PDF, 7.82 MB

english, 2014

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - Analytical techniques for mechanistic characterization of EUV photoresists

Hohle, Christoph K., Gronheid, Roel, Grzeskowiak, Steven, Narasimhan, Amrit, Murphy, Michael, Ackerman, Christian, Kaminsky, Jake, Brainard, Robert L., Denbeaux, Greg

Year:

2017

Language:

english

File:

PDF, 1.03 MB

english, 2017

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Antimony photoresists for EUV lithography: mechanistic studies

Panning, Eric M., Goldberg, Kenneth A., Murphy, Michael, Narasimhan, Amrit, Grzeskowiak, Steven, Sitterly, Jacob, Schuler, Philip, Richards, Jeff, Denbeaux, Greg, Brainard, Robert L.

Year:

2017

Language:

english

File:

PDF, 3.02 MB

english, 2017

12

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - Reactivity of metal-oxalate EUV resists as a function of the central metal

Hohle, Christoph K., Gronheid, Roel, Grzeskowiak, Steven, Narasimhan, Amrit, Murphy, Michael, Napolitano, Lee, Freedman, Daniel A., Brainard, Robert L., Denbeaux, Greg

Year:

2017

Language:

english

File:

PDF, 929 KB

english, 2017

13

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Studying secondary electron behavior in EUV resists using experimentation and modeling

Wood, Obert R., Panning, Eric M., Narasimhan, Amrit, Grzeskowiak, Steven, Srivats, Bharath, Herbol, Henry, Wisehart, Liam, Kelly, Chris, Earley, William, Ocola, Leonidas E., Neisser, Mark, Denbeaux, G

Year:

2015

Language:

english

File:

PDF, 800 KB

english, 2015

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advances in Patterning Materials and Processes XXXIII - Studying electron-PAG interactions using electron-induced fluorescence

Hohle, Christoph K., Younkin, Todd R., Narasimhan, Amrit, Grzeskowiak, Steven, Ostrander, Jonathan, Schad, Jonathon, Rebeyev, Eliran, Neisser, Mark, Ocola, Leonidas E., Denbeaux, Gregory, Brainard, Ro

Year:

2016

Language:

english

File:

PDF, 1.49 MB

english, 2016

15

Magnetic imaging with soft X-ray microscopy

Fischer, P., Denbeaux, G., Eimuller, T., Goll, D., Schutz, G.

Journal:

IEEE Transactions on Magnetics

Year:

2002

Language:

english

File:

PDF, 308 KB

english, 2002

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advances in Patterning Materials and Processes XXXIII - Cross sections of EUV PAGs: influence of concentration, electron energy, and structure

Hohle, Christoph K., Younkin, Todd R., Grzeskowiak, Steven, Narasimhan, Amrit, Wisehart, Liam, Schad, Jonathon, Neisser, Mark, Ocola, Leonidas E., Brainard, Robert L., Denbeaux, Greg

Year:

2016

Language:

english

File:

PDF, 564 KB

english, 2016

17

Imaging Magnetic Domain Structures with Soft X-Ray Microscopy

P. Fischer, T. Eimüller, G. Schütz, G. Denbeaux

Journal:

Structural Chemistry

Year:

2003

Language:

english

File:

PDF, 3.27 MB

english, 2003

18

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Evaluating vacuum components for particle performance for EUV lithography

Wood, Obert R., Panning, Eric M., Khopkar, Yashdeep, Denbeaux, Gregory, Jindal, Vibhu

Year:

2014

Language:

english

File:

PDF, 661 KB

english, 2014

19

Christianity and Civilization; Second Part: Specific Problems, by Emil Brunner. 147 pp. New York, Charles Scribner's Sons, 1949. $2.50

Journal:

Year:

1951

Language:

english

File:

PDF, 196 KB

english, 1951

20

SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - San Diego, CA (Sunday 29 July 2001)] X-Ray Micro- and Nano-Focusing: Applications and Techniques II - Experimental analysis of high-resolution soft x-ray microscopy

Chao, Weilun, Anderson, Erik H., Denbeaux, Gregory, Harteneck, Bruce D., Pearson, Angelic L., Olynick, Deirdre L., Schneider, Gerd, Attwood, Jr., David T., McNulty, Ian

Year:

2001

Language:

english

File:

PDF, 1.21 MB

english, 2001

21

ALS user meeting features 10th anniversary celebration

Robinson, Art, Mitchell, Gary, Denbeaux, Greg, Luening, Katharina, Pianetta, Piero, Shuh, David, Hasan, M. Zahid, Lanzara, Alessandra, Ralston, Corie, Cork, C. W., McDermott, G., Earnest, T. N.

Journal:

Synchrotron Radiation News

Year:

2004

Language:

english

File:

PDF, 1.34 MB

english, 2004

22

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Resist outgassing contamination growth results using both photon and electron exposures

Denbeaux, Gregory, Naulleau, Patrick P., Kandel, Yudhishthir, Kane, Genevieve, Alvardo, Diego, Upadhyaya, Mihir, Khopkar, Yashdeep, Friz, Alexander, Petrillo, Karen, Sohn, Jaewoong, Sarma, Chandra, As

Year:

2013

Language:

english

File:

PDF, 244 KB

english, 2013

23

Secondary Electrons in EUV Lithography

Torok, Justin, Re, Ryan Del, Herbol, Henry, Das, Sanjana, Bocharova, Irina, Paolucci, Angela, Ocola, Leonidas E., Ventrice Jr., Carl, Lifshin, Eric, Denbeaux, Greg, Brainard, Robert L.

Journal:

Journal of Photopolymer Science and Technology

Year:

2013

Language:

english

File:

PDF, 363 KB

english, 2013

24

The Untestable Drunk Driving Test

Denbeaux, Mark, Kahl, Nathan W., SNOW, NICHOLAS, Eschle, Richard, Litwin, Marissa, Oliver, Keith, DiPisa, Robert

Journal:

SSRN Electronic Journal

Year:

2019

Language:

english

File:

PDF, 2.82 MB

english, 2019

25

AIP Conference Proceedings [AIP SYNCHROTRON RADIATION INSTRUMENTATION: Tenth US National Conference - Ithaca, New York (USA) (17-20 Jun 1997)] - Soft x-ray sources on the Duke Storage Ring

Johnson, Lewis E., Denbeaux, Greg, Hower, Nelson, Madey, John M. J., Straub, Karl D.

Year:

1997

File:

PDF, 336 KB

1997

26

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - In-situ optical testing of exposure tools via localized wavefront curvature sensing

Miyakawa, Ryan, Naulleau, Patrick P., Zhou, Xibin, Goldstein, Michael, Ashworth, Dominic, Cummings, Kevin, Fan, Yu-Jen, Shroff, Yashesh, Denbeaux, Gregory, Kandel, Yudhi, Naulleau, Patrick

Year:

2013

Language:

english

File:

PDF, 1.16 MB

english, 2013

27

[AIP The 11th US national synchrotron radiation instrumentation conference (SRI99) - Stanford, California (USA) (13-15 Oct 1999)] AIP Conference Proceedings - Resorting the NIST undulator using simulated annealing for field error reduction

Year:

2000

File:

PDF, 591 KB

2000

28

Picosecond pump-probe using an FEL and a synchrotron source

G Denbeaux, K.D Straub, J.M.J Madey, P.G O'Shea, V Litvinenko, E Szarmes, G Barnett

Journal:

Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Year:

1996

Language:

english

File:

PDF, 254 KB

english, 1996

29

Exorcism of Ignorance as a Proxy for Rational Knowledge: The Lessons of Handwriting Identification "Expertise"

D. Michael Risinger, Mark P. Denbeaux and Michael J. Saks

Journal:

University of Pennsylvania Law Review

Year:

1989

Language:

english

File:

PDF, 4.66 MB

english, 1989

30

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Film quantum yields of EUV and ultra-high PAG photoresists

Hassanein, Elsayed, Higgins, Craig, Naulleau, Patrick, Matyi, Richard, Gallatin, Gregg, Denbeaux, Gregory, Antohe, Alin, Thackeray, Jim, Spear, Kathleen, Szmanda, Charles, Anderson, Christopher N., Ni

Year:

2008

Language:

english

File:

PDF, 376 KB

english, 2008

31

AIP Conference Proceedings [AIP THE 10TH INTERNATIONAL CONFERENCE ON X-RAY MICROSCOPY - Chicago, Illinois, (USA) (15–20 August 2010)] - Large-Area Zone Plate Fabrication with Optical Lithography

Denbeaux, G., McNulty, Ian, Eyberger, Catherine, Lai, Barry

Year:

2011

Language:

english

File:

PDF, 285 KB

english, 2011

32

[IEEE INTERMAG 2006 - IEEE International Magnetics Conference - San Diego, CA, USA (2006.05.8-2006.05.12)] INTERMAG 2006 - IEEE International Magnetics Conference - First-Order Reversal Curve Studies of Magnetization Reversal in Prototype Recording Media

Liu, K., Davies, J. E., Dumas, R. K., Zimanyi, G. T., Hellwig, O., Fullerton, E. E., Jiang, J. S., Bader, S. D., Denbeaux, G., Kortright, J. B., Roshchin, I. V., Li, C. P., Schuller, I. K.

Year:

2006

Language:

english

File:

PDF, 671 KB

english, 2006

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - AIS wavefront sensor: a robust optical test of exposure tools using localized wavefront curvature

Wood, Obert R., Panning, Eric M., Miyakawa, Ryan, Zhou, Xibin, Goldstein, Michael, Ashworth, Dominic, Cummings, Kevin, Fan, Yu-Jen, Shroff, Yashesh, Denbeaux, Greg, Kandel, Yudhi, Naulleau, Patrick

Year:

2014

Language:

english

File:

PDF, 617 KB

english, 2014

34

Transmission X-ray microscopy using X-ray magnetic circular dichroism

T. Eimüller, P. Fischer, M. Köhler, M. Scholz, P. Guttmann, G. Denbeaux, S. Glück, G. Bayreuther, G. Schmahl, D. Attwood, G. Schütz

Journal:

Applied Physics A: Materials Science & Processing

Year:

2001

Language:

english

File:

PDF, 373 KB

english, 2001

35

20-nm-resolution Soft x-ray microscopy demonstrated by use of multilayer test structures

Chao, Weilun, Anderson, Erik, Denbeaux, Gregory P., Harteneck, Bruce, Liddle, J. Alexander, Olynick, Deirdre L., Pearson, Angelic L., Salmassi, Farhad, Song, Cheng Yu, Attwood, David T.

Journal:

Year:

2003

Language:

english

File:

PDF, 732 KB

english, 2003

36

Microscopy: Photon-Based Microscopy With 20-nm Spatial Resolution

Chao, Weilun, Anderson, Erik, Denbeaux, Gregory, Harteneck, Bruce, Liddle, J. Alexander, Pearson, Angelic, Olynick, Deirdre, Salmassi, Farhad, Song, Cheng Yu, Attwood, David

Journal:

Optics and Photonics News

Year:

2003

Language:

english

File:

PDF, 85 KB

english, 2003

37

Magnetic imaging of ion-irradiation patterned Co/Pt multilayers using complementary electron and photon probes

Kusinski, G. J., Krishnan, K. M., Denbeaux, G., Thomas, G., Terris, B. D., Weller, D.

Journal:

Applied Physics Letters

Year:

2001

Language:

english

File:

PDF, 725 KB

english, 2001

38

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - A simulation study of cleaning induced EUV reflectivity loss mechanisms on mask blanks

Upadhyaya, Mihir, Denbeaux, Gregory, Kadaksham, Arun John, Jindal, Vibhu, Harris-Jones, Jenah, Lee, Byunghoon, Goodwin, Frank, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 1.52 MB

english, 2012

39

Electromigration in passivated Cu interconnects studied by transmission x-ray microscopy

G. Schneider, M. A. Meyer, G. Denbeaux, E. Anderson, B. Bates, A. Pearson, C. Knöchel, D. Hambach, E. A. Stach, E. Zschech

Year:

2002

Language:

english

File:

PDF, 1.38 MB

english, 2002

40

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Vacuum induced photoresist outgassing

Waterman, Justin, Schellenberg, Frank M., Mbanaso, Chimaobi, Denbeaux, Gregory

Year:

2008

Language:

english

File:

PDF, 324 KB

english, 2008

41

Electron Penetration Depths in EUV Photoresists

Torok, Justin, Srivats, Bharath, Memon, Shahid, Herbol, Henry, Schad, Jonathan, Das, Sanjana, Ocola, Leonidas, Denbeaux, Greg, Brainard, Robert L.

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 448 KB

english, 2014

42

20-nm-resolution soft x-ray microscopy demonstrated by use of multilayer test structures: erratum

Chao, Weilun, Anderson, Erik, Denbeaux, Gregory P., Harteneck, Bruce, Liddle, J. Alexander, Olynick, Deirdre L., Pearson, Angelic L., Salmassi, Farhad, Song, ChengYu, Attwood, David T.

Journal:

Year:

2003

Language:

english

File:

PDF, 31 KB

english, 2003

43

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Assumptions and trade-offs of extreme ultraviolet optics contamination modeling

Jindal, V., Garg, R., Denbeaux, G., Wüest, A., Schellenberg, Frank M., La Fontaine, Bruno M.

Year:

2009

Language:

english

File:

PDF, 1.13 MB

english, 2009

44

SPIE Proceedings [SPIE MOEMS-MEMS 2006 Micro and Nanofabrication - San Jose, CA (Saturday 21 January 2006)] Micromachining Technology for Micro-Optics and Nano-Optics IV - Novel method for fabrication of high-efficiency optics for short wavelength radiation

Garg, Rashi, Evertsen, James, Denbeaux, Gregory, Johnson, Eric G., Nordin, Gregory P., Suleski, Thomas J.

Year:

2006

Language:

english

File:

PDF, 405 KB

english, 2006

45

Soft-x-ray small-angle scattering as a sensitive probe of magnetic and charge heterogeneity

Kortright, J. B., Kim, Sang-Koog, Denbeaux, G. P., Zeltzer, G., Takano, K., Fullerton, Eric E.

Journal:

Physical Review B

Year:

2001

Language:

english

File:

PDF, 182 KB

english, 2001

46

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - The rational design of polymeric EUV resist materials by QSPR modelling

Jack, Kevin, Liu, Heping, Blakey, Idriss, Hill, David, Yueh, Wang, Cao, Heidi, Leeson, Michael, Denbeaux, Greg, Waterman, Justin, Whittaker, Andrew, Lin, Qinghuang

Year:

2007

Language:

english

File:

PDF, 234 KB

english, 2007

47

Demonstration of 20 nm half-pitch spatial resolution with soft x-ray microscopy

W. Chao, E. H. Anderson, G. Denbeaux, B. Harteneck, A. L. Pearson, D. Olynick, F. Salmassi, C. Song, D. Attwood

Year:

2003

Language:

english

File:

PDF, 875 KB

english, 2003

48

A full field transmission X-ray microscope as a tool for high-resolution magnetic imaging

G. Denbeaux, P. Fischer, G. Kusinski, M. Le Gros, A. Pearson, D. Attwood

Year:

2001

Language:

english

File:

PDF, 93 KB

english, 2001

49

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - EUV optics contamination studies in presence of selected hydrocarbons

Garg, R., Schellenberg, Frank M., Wüest, A., Gullikson, E., Bajt, S., Denbeaux, G.

Year:

2008

Language:

english

File:

PDF, 824 KB

english, 2008

50

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - EUV resist outgassing: scaling to HVM intensity

Antohe, Alin O., Schellenberg, Frank M., La Fontaine, Bruno M., Mbanaso, Chimaobi, Fan, Yu-Jen, Yankulin, Leonid, Garg, Rashi, Thomas, Petros, Denbeaux, Gregory, Piscani, Emil C., Wuest, Andrea F.

Year:

2009

Language:

english

File:

PDF, 522 KB

english, 2009

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